Photoresist coating device (PR coating)
Introduction to a photoresist coating device with roll coat method pre-treatment and drying!
The device can coat photoresist onto copper foil. The processing surface can be single-sided or double-sided. It includes roll coating method pre-treatment and drying. Additionally, the device configuration consists of unwinding, pre-treatment, PRC, drying, and winding. 【Specifications】 ■ Lane configuration: 2 Lanes ■ Transport speed: 2.0 m/min ■ Material width: 35mm to 160mm for TAB/CSP/COF (250mm to 300mm for FPC) ■ Material thickness: PI 25μm and above ■ Processing surface: single-sided and double-sided *For more details, please refer to the PDF document or feel free to contact us.
- Company：SETO ENGINEERING 守谷事業所
- Price：Other
